PLASMA SYSTEMS & SOURCES

Scientific Plasma specializes in manufacturing systems for plasma processing of materials and plasma enhanced chemical vapor deposition of thin films. We offer a number of advanced PECVD systems with the following salient features:

• Parallel plate diode or triode configurations

• Capacitively or inductively coupled plasma generation

• Magnetic plasma enhancement

• Hollow Cathode Plasma sources

The choice of plasma generation will depend on the specific application as well as the form and nature of the substrate and type of plasma species required. A range of state-of-the-art in-situ process diagnostics such as optical emission spectroscopy (OES), laser absorption spectroscopy, current, voltage and scanning electrostatic probes are available.

Scientific Plasma supplies two broad categories of low-cost, high performance ion sources tor thin film processing and surface modification:

• Rugged, low cost, "filament-less", cold cathode ion sources

• Broad area RF (Inductively or Capacitively coupled) ion sources

In addition, we provide several options for beam extraction and formation optics that provide alternatives for focused as well as low energy beams. These sources are well suited for a wide variety of applications including: ion beam sputtering, ion assisted deposition (lAD), ion beam deposition (IBD) and ion beam modification of surfaces.