MAGNETRON SPUTTER & CATHODIC ARC TECHNOLOGIES

The Scientific Plasma Multi-Track© Sources are compact profile planar magnetrons with extended racetracks designed to give a much larger target utilization. Several models are offered as standard: 2”, 3",4“, 6“& 8” diameter and are available in “quick disconnect” or flange-mounted versions.

The use of high flux rare-earth magnets gives the Multi-Track© the ability to operate both at low and high pressures. At low pressures, these high magnetic fields permit stable source operation by ensuring high electron trapping efficiency thus increasing the ionization efficiency thereby permitting the existence of a dense plasma even at pressures as low as 5x1 0-4 Torr. These high fields are also responsible for high-rate depositions of metals and dielectrics.

The targets in the Multi-Track© are clamped onto water cooled backing plates and can be easily removed. However, for high power operation

direct water cooling of targets is necessary.

Each Multi-Track© is designed for both DC. and RF operation and comes with an industrial grade Type-N RF co-axial connector. Thus both metals and insulators may be sputtered with ease.

The targets in the Multi-Track© are clamped onto water cooled backing plates and can be easily removed. However for high power operation

direct water cooling of targets is necessary.

Available in a variety of power ratings: 200 to 2KW in DC and 500 to 2.5KW in RF. The DC power supplies are voltage and current regulated with arc suppression. The 500W and 1.0KW supplies are low profile and mountable in standard 19“control racks.

The Multi-Track© is available in either elastomer seal or with metal gasket seals for UHV operation. The elastomer seals vary according to the source size. The 2", 3", and 4" versions are mounted on a double '0 ‘ring 'quick disconnect' type fitting that permits the substrate-source distance to be varied. Each model is also available in low profile version mounted in a Conflat® or an ASA type flange.

The Multi-Track© is also available in multi-source clusters. Configurations for both parallel and convergent sputtering, in either sputter-up or sputter down modes are available. Each source can also be fitted with a pneumatic shutter. In addition, PCS offers a variety of substrates fixturing such as dome planetaries, full-fledged individually rotating planetaries and flat plate with rotation.